Publication
Finance
Project Title | Progress | Status |
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Mechanism Of The New Doping Route For The Functionalized Graphene Oxide-conductive Polymer Using Various Atmospheric Plasma Reactions At Room Temperature Environment |
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Low Temperature Transfer-free Fabrication Of Graphene Using Radio Frequency Plasma Enhanced Chemical Vapour Deposition |
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Development Of Novel Three-dimensional Carbon Nanotubes/zinc Oxide Branched Nanostructures For Hydrogen Production And Waste Water Treatment |
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This information is generated from Research Grant Management System |
Enhancement of self-cleaning properties and durability of super-hydrophobic carbon nitride nanostructures by post-annealing treatment
Growth of plasma-enhanced chemical vapour deposition and hot filament plasma-enhanced chemical vapour deposition transfer-free graphene using a nickel catalyst.
Growth of plasma-enhanced chemical vapour deposition and hot filament plasma-enhanced chemical vapour deposition transfer-free graphene using a nickel catalyst
Investigations on the Role of N2:(N2 + CH4) Ratio on the Growth of Hydrophobic Nanostructured Hydrogenated Carbon Nitride Thin Films by Plasma Enhanced Chemical Vapor Deposition at Low Temperature
Optimizing rf power for preferential C≡N bond formation in a-CN x thin films prepared by rf- PECVD technique
Effect of N2 composition ratio and annealing on morphology and optical properties of a-CNx thin films
Fabrication and characterization of co-sputtering Au/SiO2 thin films prepared by RF magnetron sputtering.
Influence of nitrogen/methane ratio on the properties of hydrogenated amorphous carbon nitride deposited by r.f. PECVD technique