Effects of hydrogen dilution on CNx film properties deposited using rf PECVD from a mixture of ethane, nitrogen and hydrogen
2013
Catalyst free carbon nitride nanostructures prepared by rf-PECVD technique on hydrogenated amorphous carbon template
2013
Amorphous silicon carbon films prepared by hybrid plasma enhanced chemical vapor/sputtering deposition system: Effects of r.f. power
2013
Effect of N2 flow rate on the properties of CNx thin films prepared by radio frequency plasma enhanced chemical vapor deposition from ethane and nitrogen
2010
Effects of rf power on the structural properties
of carbon nitride thin films prepared by plasma
enhanced chemical vapour deposition
2010
Effects of methane and nitrogen flow rate ratio
on the
formation of carbon nitride nanostructures
deposited
by radio frequency plasma enhanced chemical
vapour
deposition.
2010
Effect of pre-deposited carbon layer on the
formation of carbon nitride nanostructures
prepared by radio-frequency plasma enhanced
chemical vapour deposition
2010
Physical Characteristics of Amorphous Carbon
Films Prepared by Plasma Enhanced Chemical Vapour
Deposition
